Abstract

Diamond films deposited on stainless steel using a Cr/CrSiN interlayer exhibit excellent adhesion under static conditions but poor adhesion under scratch conditions. We developed a new interlayer Cr/CrSiVN and investigated the influence of different vanadium (V) contents on the adhesion. The adhesion of diamond films under scratch conditions is significantly improved with V content increasing from 0 to 4.1 at.%. Specifically, the critical load increases from 2.2 ± 0.8 N (0% V) to 21.2 ± 0.8 N (4.1% V), corresponding to a roughly 864% enhancement. High adhesion is ascribed to a certain thickness of carbide, the reduction in pores at the diamond/interlayer interface, and the enhanced hardness of the CrSiVN interlayer by solid solution strengthening. The formation rate of carbide is reduced due to a low carbon diffusion by the substitution of Cr atoms by V atoms in the interlayer, leading to a low carbonization rate of the interlayer and small pores at the interface. This work is of great significance to the promotion and practical application of diamond films in medical and food-processing equipment.

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